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Phone
13761090949
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Address
5th Floor, Helen International Building, 778 Baoshan Road, Hongkou District, Shanghai
Shanghai Juna Technology Co., Ltd
13761090949
5th Floor, Helen International Building, 778 Baoshan Road, Hongkou District, Shanghai
硒化锗晶体 GeSe (Germanium Selenide)
晶体尺寸:~10毫米
电学性能:半导体
晶体结构:斜方晶系
晶胞参数: a = 0.383 nm, b = 0.440 nm, c = 1.078 nm, α = β = γ = 90°
晶体类型:合成
晶体纯度: >99.995%

X-ray diffraction on a GeSe single crystal aligned along the (100) plane. XRD was performed at room temperature using a D8 Venture Bruker. The 4 XRD peaks correspond, from left to right, to (h00) with h = 2, 4, 6, 8

Powder X-ray diffraction (XRD) of a single crystal GeSe. X-ray diffraction was performed at room temperature using a D8 Venture Bruker.

Stoichiometric analysis of a single crystal GeSe by Energy-dispersive X-ray spectroscopy (EDX).

Raman spectrum of a single crystal GeSe. Measurement was performed with a 785 nm Raman system at room temperature.