Tousimis AUTOSAMDRI-815/815B Series B Fully Automatic Critical Point Drying Instrument from the United States

AUTOSAMDRI-815/815B Series B Series CPD

Fully automatic critical point dryer

This series is a desktop fully automatic critical point dryer that can work in ultra clean rooms. There are 2 models to choose from:

1) AUTOSAMDRI-815 Series B, used for supercritical drying of 1 "wafers

2) AUTOSAMDRI-815B Series B, used for supercritical drying of wafers not exceeding 4 inches

Principle of critical point drying
The reason why it is called critical point drying (also known as supercritical drying) is because it has continuity of state, that is, the medium has no significant difference between liquid and gas, and the surface stress at the interface is reduced to zero. This phenomenon has a specific temperature and pressure, known as the critical point. The condition of zero surface stress can be used for drying biological samples or aqueous material samples, avoiding damage to the samples caused by surface stress.
We often need to perform dehydration treatment (gradient dehydration) when preparing biological samples or aqueous material samples under electron microscopy (scanning electron microscopy transmission electron microscopy), but the critical point of water is+374 ℃ and 3212 psi, which is inconvenient and prone to damage the sample. CO2 is usually a very convenient critical point drying medium, with a critical point at+31 ℃ and 1072 psi. However, it is not easy to mix with water, so a third medium must be used, usually ethanol or acetone as an intermediate liquid. In this way, when converting the transition liquid, i.e. CO2, from liquid to gas, there is no surface stress on the sample at the critical point.

Features and advantages

Implement automatic processing through a microprocessor controller; Anti static design, suitable for cleanroom material manufacturing applications

LED indication, making the operation of each program mode clear at a glance

Realize precise flow control through micro metering valves and support repeatable precise flow settings.

Convenient top mounted working chamber with a visual window for observing the internal state of the chamber

Equipped with filtering devices to protect samples and valves. Internal filtration can remove the filtered liquid CO₂Directly transported to the working chamber, with particle filtration as low as 0.08 µ m and a retention rate of over 99.999%

The inner surface material is resistant to environments with liquid CO2, ultra pure ethanol, and acetone

Automatic critical point temperature pressure regulation to ensure system safety; Preset static pressure control module, automatically controls system pressure and maintains pressure stability

⊙ Quickly cool the chamber and reduce it from room temperature to nearly 0 ℃ within 3 minutes (815B can automatically maintain temperature in FILL and PURGE modes)

For815BType, equipped with filling blocks, can reduce the chamber diameter to 3 ", 2" or 1.25 ", reduce CO2 waste, and maximize the efficiency of liquid CO2 use

Each run can handle wafers with diameters of 5 x 4 ", 5 x 3", 5 x 2 ", 5 x 1", or 5 x 10mm square crystals (providing HF compatible wafer/square crystal sample racks for easy transportation and processing of wafers and square crystals)

Equipped with a built-in condenser, it separates waste ethanol and carbon dioxide, eliminates any pipeline freezing or static electricity in the body, and the entire process is noise free

Specification

➢ Working chamber diameter: 1.25 "I.D. @ 815 Series B; 4.5" I.D@815BSeries B

Pressure measurement range: 0-2000psi

Temperature measurement range:- 30°C to 60°C

➢ Control mode: Fully automatic button control

conventional arrangement

✓ Flexible woven stainless steel high-pressure resistant pipe, used for transporting liquid CO2

✓ For815BType, equipped with 3 chamber filling blocks, can reduce the chamber diameter to 3 ", 2" or 1.25“

✓ External liquid CO2 filtration system (# 8784), capable of removing water/oil and small particles

✓ Anti static exhaust pipe, used for exhaust during PURGE/VENT/BELED and COOL

✓ Spare sample chamber O-ring, chamber lighting and fuse

Note:Tousimis products from the United States have a history of nearly 50 years and have a very good reputation among Chinese customers. Qinsi Technology is the agent of its CPD supercritical dryer in China. TousimisCritical point dryerProducts are divided intoNon cleanroom versionandCleanroom versionTwo major categories,The former is commonly used for electron microscopy sample preparation, while the latter is mostly used for material research in ultra clean rooms;

Non cleanroom versionThere are a total of 7 types of CPD:

1）Samdri ®- PVT-3D Conventional Critical Point Drying Instrument

2）Samdri ®- 795 semi-automaticCritical point dryer

3）Autosamdri ®- 815 Series A Fully Automatic Critical Point Drying Instrument

4）Autosamdri ®- 815B Series AFully automatic critical point dryer

5）Autosamdri ®- nine hundred and thirty-one_1.25"Touch Screenfully automaticCritical point dryer

6）Autosamdri ®- 931_2.50"Touch Screenfully automaticCritical point dryer

7）Autosamdri ®- 931_3.40"Touch Screenfully automaticCritical point dryer

Cleanroom versionThere are a total of 9 types of CPD:

1）Autosamdri ®- 815 Series BFully automatic critical point dryerFor Die & 1”Wafers

2）Autosamdri ®- 815B Series BFully automatic critical point dryerFor 4”Wafers

3）Automegasamdri ®- 915B, Series BFully automatic critical point dryer for 6 "Wafers

4）Autosamdri ®- nine hundred and thirty-one_1.25"Touch ScreenFully automatic multi-purposeCritical point dryer

5）Autosamdri ®- 931_2.50"Touch ScreenFully automatic multi-purposeCritical point dryer

6）Autosamdri ®- 931_3.40"Multi purpose touch screenfully automaticCritical point dryer

7）Autosamdri ®- nine hundred and thirty-fourTouchscreen C seriesfully automaticCritical point dryerFor 4”Wafers

8）Automegasamdri ®- nine hundred and thirty-sixTouchscreen C seriesfully automaticCritical point dryerFor 6”Wafers

9）Automegasamdri ®-938Touchscreen C seriesfully automaticCritical point dryerFor 8”Wafers

Tousimis supercritical dryer widely used in the United StatesIt is suitable for biological samples, gel and other fragile and complex samples with micro nano 3D structures, as well as MEMS MOF、 The critical point drying of material samples such as carbon nanotubes, graphene, and semiconductor wafers (with a maximum sample size of 8 inches, drying 5 pieces at a time). The principle of using CO2 critical point state without liquid phase surface tension to cause sample shrinkage deformation to obtain dry samples with real morphology is an effective method for drying and preparing biological samples such as cell tissues and semiconductor material samples containing water or other liquids; It has the characteristics of easy operation, precise control, and repeatable results. Customers can choose different models based on different applications.