Zeiss metallographic microscope Axio Imager Vario

Zeiss metallographic microscope Axio Imager Vario

introduce

Detecting large-sized samples - equipped with an automatic focusing system and meeting the requirements of ultra clean room standards
Analyze from extremely small MEMS sensors to ultra large XXL wafers, or even whole flat plate microscopes, without causing damage to the samples. With a maximum lateral movement distance of 300 mm and a maximum vertical depth of 254 mm, you canZeiss metallographic microscopeAxio Imager Vario detects a large number of samples. The integrated column design ensures stability. In the application of wafer inspection in ultra clean rooms - Axio Imager Vario has been certified according to DIN EN ISO 14644-1 standard and meets the requirements of cleanroom level 5. Using an electric motor that drives the Z-axis and automatic focusing hardware to ensure automatic adjustment to a better focusing position.

characteristic

Two manual and one electric motor column (equipped with three mode control buttons that comply with industry standards) are available for selection, fully utilizing the advantages of the microscope's maximum horizontal and vertical movement distance of 300 mm and maximum vertical depth of 254 mm.
Zeiss metallographic microscopeThe Axio Imager Vario can focus the sample by moving the objective lens up and down. This means that even heavier samples can achieve high precision focusing accuracy and repeatability.
With the help of autofocus hardware, you can accurately and quickly focus low contrast reflective samples.
Axio Imager Vario combined with LSM 700 for high-resolution non-contact analysis of sensitive samples.
Axio Imager Vario has been certified according to DIN EN ISO 14644-1 standard and meets the requirements of cleanroom level 5.

Ultra clean room

Semiconductor manufacturing and wafer inspection need to be completed in an ultra clean room. According to DIN EN ISO 14644-1 standard, it is classified into different grades based on the number and size of particles per cubic meter. In cleanroom applications, Axio Imager Vario has been certified to this standard and meets the requirements of cleanroom level 5. The ISO 5 level for cleanrooms is equivalent to the 100 level of the original FED STD 209E (1992) standard. The cleanroom kit includes a 7-hole objective lens turntable, a particle protection cover, and an anti sneeze protection cover.

Auto focus hardware

Integrated with Auto Focus hardware systemZeiss metallographic microscopeThe Axio Imager Vario is capable of achieving fast and precise focusing within a focal capture range of up to 12000 µ m. In industrial production and research applications, you need a high-precision focusing system with a focusing accuracy of 0.3 times the depth of field of the objective lens. This automatic aggregation hardware is suitable for applications that use reflected light, transmitted light, bright field, dark field, polarization, differential interference phase difference, and oblique illumination observation methods.