ion milling machine

SEMPREP SMARTion milling machine

SEMPREP SMARTion milling machineEquipped with high-energy and optional low-energy argon ion guns. This device is an ideal choice for the final processing and cleaning of scanning electron microscopy (SEM) and electron backscatter diffraction (EBSD) samples. Ion processing can improve and clean SEM samples of mechanical polishing and prepare non-destructive surfaces for EBSD analysis. This device is also suitable for fast section processing. We can prepare high-precision and high-quality samples for you, achieving excellent results in semiconductor testing or cross-sectional inspection of lithium-ion battery separators.

Key Features:

• Advanced ion gun design and automation capabilities

• New user-friendly operating software: providing intelligent assistance for users

• More precise needle valve: allows for fine adjustment of airflow

• High precision adjustability: used for fine adjustment operations
• Longer lifespan and high vacuum sensor

Product Features:

• Optional Low Energy Gun (LEG)

• Optional new LN2 cooling system

• Optional Vacuum Transfer Unit (VTU) for extracting samples under vacuum conditions

• Independent alignment sample stage: used for precise sample positioning during 90 ° processing

Technical Specifications:

Ion gun:

Ultra high energy ion gun, capable of reaching up to 16 keV

sample size

Cross section sample stage (optional 30 °, 90 ° sample stage):

• 30 ° sample stage: maximum size 16.4mm (length) x 16mm (width) x 3.1mm (Thick)

• 90 ° sample stage: maximum size 18.6mm (length) x 16mm (width) x 6mm（thick)

Flat sample stage for surface processing (EBSD), equipped with three different head types

• Flat head type: maximum diameter 50mm x 4mm

• Standard type: maximum diameter 32mm x 15mm

• Hollow type: maximum diameter 25mm x 23mm

Sample stage movement

• Sample tilt angle: 0 ° to 30 °, continuously adjustable every 0.1 °

• Sample rotation angle adjustment: 360 degrees Variable speed sample rotation, adjustable angle and speed

• Sample processing swing angle (swing): ± 10 ° to ± 120 °, continuously adjustable every 5 °

Sample cooling (optional)

Liquid nitrogen cooling or Peltier cooling

Vacuum system

Oil free diaphragm pump and molecular pump

Gas supply system

99.999% purity argon working gas, high-precision needle valve flow rateControl

molecular pump

HiPace 80 Neo.

Imaging system

5-megapixel CMOS camera with measurement function within the image

Computer control

Easy to use graphical interface, automated ion gun operation and sample stagePosition calibration

Processing using argon ion beam