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Zhongke Ruiyang Membrane Technology (Beijing) Co., Ltd
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Nanofiltration membrane 4040

NegotiableUpdate on 01/04
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Overview

The molecular weight cut-off of nanofiltration membrane 4040 is between reverse osmosis membrane and ultrafiltration membrane, approximately 200-800 daltons. Retention characteristics: Priority is given to the retention of divalent and multivalent anions, and the retention rate of monovalent ions is related to the concentration and composition of the feed solution. Nanofiltration is generally used to remove organic matter and pigments from surface water, hardness from groundwater, and partially remove dissolved salts. It is used for substance extraction and concentration in food and biopharmaceutical production. The operating pressure of nanofiltration membranes is generally 3.5-30 bar.

Product Details

Nanofiltration membrane 4040The cut-off molecular weight is between reverse osmosis membrane and ultrafiltration membrane, approximately 200-800 daltons. Retention characteristics: Priority is given to the retention of divalent and multivalent anions, and the retention rate of monovalent ions is related to the concentration and composition of the feed solution. Nanofiltration is generally used to remove organic matter and pigments from surface water, hardness from groundwater, and partially remove dissolved salts. It is used for substance extraction and concentration in food and biopharmaceutical production. The operating pressure of nanofiltration membranes is generally 3.5-30 bar.

Nanofiltration membrane 4040Material: polyamide, sulfonated polyether sulfone, sulfonated polysulfone.

We offer a variety of roll type nanofiltration membrane elements with fine molecular weight cut-off, which have compact structures and reasonable surface area/volume ratios. By using different channel networks (13-120mil), the width of the material liquid channel can be changed to adapt to various viscosities of the material liquid. To meet the applications of certain special industries, we can provide acid and alkali resistant, high temperature resistant, and anti pollution film products.