The Sigma product line combines field emission and scanning electron microscopy technology (FE-SEM). Its most notable feature is its outstanding imaging and analysis performance. With Sigma, you will have only four steps through the use of integrated airlocks, top-notch EDS geometry, and intuitive workflows. Sigma provides you with detector technology for high-resolution imaging. This microscope is designed to handle different operating conditions and can adapt to accurately suit your application. Sigma produces high-quality, clear, and high contrast images - from nanoparticles and nanofibers to semiconductors and MEMS components,
The Sigma product line combines field emission and scanning electron microscopy technology (FE-SEM). Its most notable feature is its outstanding imaging and analysis performance. With Sigma, you will use methods such as Integrated airlock, top-notch EDS geometry, and intuitive workflow with only four steps. Sigma provides you with detector technology for high-resolution imaging. This microscope is designed to handle different operations The conditions can be adapted to precisely suit your application. Sigma produces high-quality, clear, and high contrast images - from nanoparticles and nanofibers to semiconductors and MEMS components, all the way to solar cells. It provides you with information on terrain, composition, crystallography, and element distribution for comprehensive sample characterization. Configure according to your needs resolution 0.8 nm 30kv (STEM) 0 at 15 kV. 8nm 1.6 nm at 1 kV 2.0 nm, 30kV (VP mode) Accelerating Voltage 0.02 - 30kv The sample is currently 4pa -20na (100na optional) amplify 10 - 1,000,000 × the Transmitter Schottky field emitter standard detector Inlens SE, ETSE detector, VPSE-G4 (VP mode)
Simple. More intelligent. More integration. Automated workflows guide you step by step to improve your productivity. Sigma provides you with top-notch analytical performance, especially when dealing with beam sensitive samples. Integrated airlocks can achieve high sample throughput for wafers up to 5 "in size. Optimize optics by combining electrostatic and magnetic fields Simultaneously reducing the impact of the field on the performance of the sample. The Inlens Duo detector for SE and BSE signals allows you to obtain terrain and composition information in a single detector. The Gemini beam booster technology allows for small beam diameters and high signal-to-noise ratios, even at extremely low acceleration voltages. Create for your application Analyze the required materials and manufacturing components High resolution terrain information of damaged microstructures and MEMS components. Real time creation of 3D surface measurements for precision machined components to determine the causes of fractures and defects. • Use a wide range of detectors to create high resolution Imaging and analysis of nanomaterials. Analyze coatings and films to reveal hidden surface details of non-conductive particles. • Use Descartes electric platform to process large metal samples in the chamber for in-situ plasma cleaning to maintain high image quality, obtain crystals and channels contrast. Sigma's atmospheric barrier allows you to quickly replace wafers on semiconductor and electronic samples. Capture terrain images of element layers at high magnification
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