Compact DC Magnetron Sputtering Coating Instrument

characteristic

1. Specially designed for coating conductive gold film on SEM samples.

2. The compact plasma sputtering coating machine is designed specifically for metal coatings such as gold, platinum, and silver.

3. Includes a 2 "gold (4N) target.

INPUT VOLTAGE

• 220 VAC 50/60Hz, 200W
• <1000 W (including vacuum pump power)
• A 110VAC power supply can be obtained using a 1000 W transformer (15 A fuse).

Output voltage

500 VDC

Sputtering current

• 0-50 mA (max) adjustable sputtering current
• Digital ammeter (mA)
• Overcurrent protection

sputtering time

Adjustable from 1 to 120 seconds

specimen chamber

Quartz glass tube, 165

Mm outer diameter x 150 mm inner diameter x 150 mm height

sample stage

2 'diameter, adjustable height, 30-80 mm from sample to target

Sputtering head

2 'magnetron sputtering head. A manually operated shutter is used to protect the target

• vacuum pressure
• Digital vacuum pressure gauge (Pa)
• KF25 vacuum pump connector

The maximum vacuum pressure of a mechanical pump is 1, and the pump is not included.

• Input gas

• Install a 1/4 Swagelock type fitting for connecting inert gas cylinders.

There is a metering valve on the front panel for regulating the input gas.

• Target material
• Including a gold target with a diameter of 50mm × 0.12mm
• 4N purity gold foil:

50 mm (2 inches) diameter x

0.12 mm (including and pre installed on the coating machine)

Optional target material

Golden target (50 mm diameter x 0.12)

Mm, 4N purity)

Platinum target (50 mm diameter x 0.12 mm, 4N purity)

Silver target (50 mm diameter x 0.5 mm, 4N purity)

This model is suitable for coating gold, silver, and platinum. And due to its low energy, it is not suitable for coating light metal materials such as Al, Mg, Zn, or carbon targets. Please consider our high-power DC/RF magnetron sputtering coating machine or thermal evaporation coating machine.

Product size and weight