Magnetron sputtering/vacuum evaporation composite coating equipment ..

NegotiableUpdate on 08/04

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Overview

Brief introduction: The magnetron sputtering/vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in the same coating equipment. It not only uses magnetron sputtering cathode glow discharge to splash out target atoms and partially ionize and deposit them on the substrate to form a film, but also uses resistance heating in vacuum to melt and vaporize the metal plating material before depositing it on the substrate to form a film. Increased the purpose and flexibility of the equipment. This device is used for metalizing plastic surfaces such as phone cases, and for depositing non-conductive films and electromagnetic shielding films.

Product Details

Details introduction:

Magnetron sputtering/The vacuum evaporation composite coating equipment combines magnetron sputtering technology and vacuum evaporation technology in the same coating equipment. It not only uses magnetron sputtering cathode glow discharge to splash out target atoms and partially ionize and deposit them on the substrate to form a film, but also uses resistance heating in vacuum to melt and vaporize the metal plating material before depositing it on the substrate to form a film. Increased the purpose and flexibility of the equipment. This device is used for metalizing plastic surfaces such as phone cases, and for depositing non-conductive films and electromagnetic shielding films.

Magnetron sputtering/The vacuum evaporation composite coating equipment is equipped with a plasma treatment device, an efficient magnetron sputtering cathode, and a resistance evaporation device. The equipment has a fast deposition rate, good coating adhesion, fine and dense coating, high surface smoothness, and good uniformity and consistency; This machine realizes fully automated control of coating process, with large loading capacity, reliable operation, high qualification rate, low production cost, and green environmental protection. This device is widely used in industries such as computer cases, phone cases, and household appliances. It can be coated with metal film, alloy film, composite film, transparent (semi transparent) film, non-conductive film, electromagnetic shielding film, etc.

Technical parameters of magnetron sputtering/vacuum evaporation composite coating equipment:

PRODUCT MODEL		Magnetron sputtering/Vacuum evaporationComposite coating equipmentCY-MSE300S-DC
sample stage		Sample table size	φ185mm
		precision	±1℃
		rotational speed	1-20rpmadjustable
		Sputtering current	2~20mA
		Sputtering voltage	1000V
		Steam source	Tungsten wire basket
		*High temperature	1700℃
		Accurate temperature control	Can be set30The temperature rise and drop program has a temperature control accuracy of+/-1℃
Vacuum Chamber		Cavity Size	φ300mm × 300mm
		view window	φ100mm
		Material of the cavity	stainless steel
		Opening method	Top opening type
Film thickness monitor	Monitoring components	power supply	DC5V（±10%）, * high current400mA
		frequency resolution	±0.03Hz
		Film thickness resolution	0.0136Åaluminium
		Accuracy of film thickness	±0.5%It depends on the process conditions, especially the position of the sensor, material stress, temperature, and density
		measurement speed	100ms-1s/Secondly, it can be set
		measuring range	500000Åaluminium
		Standard sensor crystal	6MHz
		computer interface	RS-232/485Serial interface (baud rate)1200、2400、4800、9600、19200、38400Can be set, data bit:8Stop position:1, verification: none)
		Analog Output	8Bit resolution,PWMPulse width modulation output (open collector or internal)5VOutput)
		work environment	temperature0-50℃, humidity5%-85%RHThere should be no condensation droplets
	indicator	Input power supply	AC 220V±10%
		Output power supply	DC 5V 3A
		monitor	12×2Digital tube andLED
		Communication Port	RS-485(Baud rate)1200、2400、4800、9600、19200、38400Can be set, data bit:8Position, stop position:1position Parity check: none)
	probe	Applicable chip frequency	6MHz
		Applicable chip size	Φ14mm
		mounting flange	CF35
		Cooling water pipe	Φ3mm, Length300mm、500mm、1000mm
		cooling water pressure	<0.3MPa
		Pneumatic baffle pipeline	Φ3mm
		Baking temperature	Water supply status<200℃, Non water state flange<100℃
		electrical interface	BCNsocket
Mass flowmeter		2Road; range100sccm；100sccm(Multiple air paths can be customized according to customer needs)
vacuum system		PRODUCT MODEL	CY-GZK103-A
		Extraction interface	KF40
		molecular pump	CY-600
		Exhaust interface	KF16
		Front pole pump	Rotary vane pump
		vacuum measurement	Composite vacuum gauge
		mbar	1.0E-5Pa
		power supply	AC;220V 50/60Hz
		pumping speed	Molecular pump:600L/S Rotary vane pump:1.1L/S Comprehensive pumping performance:20The vacuum degree can reach:1.0E-3Pa
Options		Various target materials such as gold, indium, silver, platinum, etc
warranty		One year warranty, lifetime technical support.

Disclaimer: The product introduction content on this website (including product images, product descriptions, technical parameters, etc.) is for reference only. Due to delayed updates, there may be some discrepancies between the content and the actual situation. Please contact our sales personnel for confirmation. The information provided on this website does not constitute any offer or commitment. Our company will periodically improve and modify any information on the website without prior notice. We apologize for any inconvenience caused.